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NASA Technical Reports Server (NTRS) 19910021944: Etching method fo... |
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by NASA Technical Reports Server (NTRS) |
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A method for etching or removing polymers, photoresists, |
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and organic contaminants from a substrate is disclosed. |
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The method includes creating a more reactive gas species |
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by producing a plasma discharge in a reactive gas such as |
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oxygen and contacting the resulting gas species with a |
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sacrificial solid organic material such as polyethylene |
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or polyvinyl fluoride, reproducing a highly reactive gas |
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species, which in turn etches the starting polymer, |
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organic contaminant, or photoresist. The sample to be |
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etched is located away from the plasma glow discharge |
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region so as to avoid damaging the substrate by exposure |
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to high energy particles and electric fields encountered |
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in that region. Greatly increased etching rates are |
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obtained. This method is highly effective for etching |
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polymers such as polyimides and photoresists that are |
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otherwise difficult or slow to etch downstream from an |
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electric discharge in a reactive gas. |
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Date Published: 2016-09-26 22:25:45 |
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Identifier: NASA_NTRS_Archive_19910021944 |
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Item Size: 15756478 |
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Language: english |
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Media Type: texts |
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