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DTIC ADA231022: A Spectroscopic Differential Reflectometry Study of...
by Defense Technical Information Center
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Spectroscopic Differential Reflectometry, SDR, has been
applied to study differences in silicon surfaces with
different crystallographic orientations and with very
thin films. The SDR technique measures the normalized
difference in reflectance of two adjacent samples in the
spectral range of 250-800 nm near normal incidence. This
study demonstrates the surface sensitivity of the SDR
technique to the Si crystal orientations, and to the
presence of thin oxide films on the Si substrate. The
observed orientation dependent spectral features are
interpreted in terms of the current understanding of the
silicon orientation dependent oxidation kinetics.
Date Published: 2018-02-28 08:01:50
Identifier: DTIC_ADA231022
Item Size: 12340753
Language: english
Media Type: texts
# Topics
DTIC Archive; Chongsawangvirod, S ; N...
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