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DTIC ADA109305: Electrical Compensation in InP Produced by Backgrou...
by Defense Technical Information Center
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A steady-state liquid phase epitaxial growth system is
being used to study the factors that influence the
nucleation, growth and purity of InP. Humidity (>30%
relative) has been found to be a major contaminant that
leads to erratic growth morphologies and poor electrical
properties. With the growth system and substrate
preparations in a low humidity (<20% relative) room the
reproducibility of epitaxial growths has been improved.
The discoloration of the bone white pyrolytic boron
nitride growth cell has helped to identify several
sources of contamination that oxidize the In-melt and
lead to premature nucleation. The nucleation and growth
of epitaxial InP now appears to be limited by phosphorus
transport instabilities in the P-saturated In-melt. A
thermochemical analysis of phosphorus equilibria with In
and InP may provide an insight into liquid solid
stability conditions. The results are in excellent
agreement with the stability of the In-P liquidus curve
and InP substrates under PH3-H2 mixtures. The analysis
appears to indicate that the partial pressure of P4
controls the nucleation of InP and the stability of the
In-P liquidus curve. At temperatures below 700 deg C the
partial pressure of P2 is greater than that for P4 and
appears to stabilize the InP substrate degradation.
(Author)
Date Published: 2017-12-31 03:08:48
Identifier: DTIC_ADA109305
Item Size: 19726504
Language: english
Media Type: texts
# Topics
DTIC Archive; Mattes, B. L.; MICHIGAN...
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