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DTIC ADA045536: Chemical Vapor Deposition of Silicon Nitride.
by Defense Technical Information Center
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Experimental work during the past year has established
the basic processing outlines for the deposition of
crystalline alpha-Si3N4 plates and dome geometries.
Preliminary correlations between critical processing
variables and microstructure have been established.
Property evaluations of deposits include: flexure
strength, Young's moduli, thermal expansion,
electromagnetic transmittance and reflectance,
microhardness and fracture toughness deduced from
identation and grooved double-cantilever beam
experiments. (Author)
Date Published: 2016-12-20 08:32:23
Identifier: DTIC_ADA045536
Item Size: 63832959
Language: english
Media Type: texts
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